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Yale University Selects Vistec EBPG5000plus Electron-Beam Lithography System for Advanced Nanotechnology Research (Business Wire via Yahoo! Finance)

WATERVLIET, N.Y.—-Vistec Lithography, Inc. announced today that Yale University, New Haven, Connecticut, selected Vistec’s EBPG5000plus electron-beam lithography system for its future nanotechnology research programs.

This entry was posted on Tuesday, March 9th, 2010 at 4:08 am and is filed under Nanotechnology. You can follow any responses to this entry through the RSS 2.0 feed. You can skip to the end and leave a response. Pinging is currently not allowed.

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